Optical microlithography XXIII
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Optical microlithography XXIII 23-25 February 2010, San Jose, California, United States by Mircea V. Dusa

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Published by SPIE in Bellingham, Wash .
Written in English

Subjects:

  • Integrated circuits,
  • Congresses,
  • Masks,
  • X-ray lithography,
  • Microlithography,
  • Manufacturing processes

Book details:

Edition Notes

Includes bibliographical references and author index.

Other titlesOptical microlithography 23, Optical microlithography twenty-three
StatementMircea V. Dusa, Will Conley, editors ; sponsored and published by SPIE; cooperating organization, SEMATECH Inc. (United States)
SeriesProceedings of SPIE -- v. 7640, Proceedings of SPIE--the International Society for Optical Engineering -- v. 7640.
ContributionsSPIE (Society), SEMATECH (Organization)
Classifications
LC ClassificationsTK7835 .O6653 2010
The Physical Object
Pagination2 v. :
ID Numbers
Open LibraryOL25202754M
ISBN 100819480541
ISBN 109780819480545
LC Control Number2011293385
OCLC/WorldCa670228821

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Proc. SPIE , Optical Microlithography XXIII, I (10 March ); doi: / Read Abstract + Source Mask Optimization (SMO) 1 is proposed and being developed for the 32 nm generation and beyond in order to extend dose / focus margin by simultaneous optimization of the illuminator source shape and a customized mask. Optical lithography has been used for semiconductor manufacturing for half of century with its maturity and extendibility. With recent next generation lithography, such as EUVL (Extreme Ultra-Violet Lithography), NIL (Nano-Imprint Lithography), and DSA (Directed Self-Assembly), optical lithography will be still main role of patterning for. The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been Format: Hardcover. KEYWORDS: Optical lithography, Lithography, Metamaterials, Optical metamaterials, Split ring resonators, Immersion lithography, High volume manufacturing, Maskless.

Basic Optics: Microlithography Imaging Aberrations, Defocus, and Zernike Polynomials • Definition of a perfect optical system: • 2. If the object is a plane surface perpendicular to the axis of the optical system, the image of any point on the File Size: 1MB. COVID Resources. Reliable information about the coronavirus (COVID) is available from the World Health Organization (current situation, international travel).Numerous and frequently-updated resource results are available from this ’s WebJunction has pulled together information and resources to assist library staff as they consider how to handle . Proc. SPIE , Metrology, Inspection, and Process Control for Microlithography XXIII, M (24 March ); doi: / Read Abstract + Optical critical dimension (OCD) metrology has been well-accepted as standard inline metrology tool in semiconductor manufacturing since 65nm technology node for its un-destructive and versatile. Melville D, Rosenbluth AE, Tian K, Lai K, Bagheri S, Tirapu-Azpiroz J et al. Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations. In Optical Microlithography by:

Basic Optics: Microlithography Topics Book pages • 1. Electromagnetic Radiation • 2. Refractive Index and refraction • 3. Optical Path length • 4. Lens Basics • 5. Geometrical Optics • References • * Elements of Modern Optical Design, Donald C. O’Shea, John Wiley and Sons • ISBN Lithography (from Ancient Greek λίθος, lithos, meaning 'stone', and γράφειν, graphein, meaning 'to write') is a method of printing originally based on the immiscibility of oil and water. The printing is from a stone (lithographic limestone) or a metal plate with a smooth was invented in by German author and actor Alois Senefelder as a cheap method of publishing. OPTICAL LITHOGRAPHY TECHNIQUES OPTICAL RESISTS The resist system used almost universally for optical microlithography today is the so-called DNQ system: novolak resin with a diazonaphthoquinone sensitizer. The basic form for the resin and . Name: Proceedings of SPIE - The International Society for Optical Engineering: Volume: ISSN (Print) X: ISSN (Electronic) X.